ELECTRICAL RESISTIVITY PROFILING TO DELINEATE LOW GROUNDWATER ARSENIC TARGET ZONES IN THE TERAI, NAWALPARASI, NEPAL
The sediment texture-arsenic content correlation depends on redox control of arsenic mobility, and such control has been demonstrated to be the dominant mechanism of arsenic release in South Asia. Presumed rapid infiltration of oxidizing waters in coarser sediments limits reductive desorption of arsenic, resulting in low groundwater arsenic concentrations. In this preliminary study a 2-km 2-D electrical resistivity profile was made across an arsenic hot-spot in Nawalparasi, the highest arsenic district of Nepal. Resistivity was calibrated to aquifer lithology by anchoring the profile at the USGS Kasiya lithologic core hole. Groundwater arsenic measurements from a previous blanket testing program (ENPHO) were used to determine arsenic at well total-depth (TD). Out of 240 wells, 75% with resistivity < 100 ohm-m (significant clay content) at TD exhibited high arsenic (> 150 ppb), while 75% of zones with higher resistivity contained arsenic < 150 ppb. Arsenic below 150 ppb can be remediated with extremely low-cost solar oxidation (SORAS) using household materials, and may be the most realistic target threshold for resistivity surveys. Presumably at least in headwater regions coarser sediments at depth are hydraulically well-connected to the surface, and therefore support relatively oxidizing conditions.