HF ANALYSIS IN ZIRCON BY LA-MC-ICPMS: PROMISE AND PITFALLS
Using only in-run uncertainty for individual zircon Hf analyses underestimates the potential sources of uncertainty. One solution in assessing overall uncertainty in a laser Hf measurement is to analyze a suite of zircon standards with Lu/Hf and Yb/Hf ratios that closely match the unknown zircons being analyzed, using the same parameters as used for the unknowns. We have determined the Lu-Hf isotopic compositions on solutions of several well-known zircon standards purified by ion chromatography for use in assessing the quality of laser Hf analyses in our laboratory: R33, 176Hf/177Hf = 0.282767 ± 18, 176Lu/177Hf = 0.00177 (n=4); Temora, 176Hf/177Hf = 0.282672 ± 12, 176Lu/177Hf = 0.00106 (n=3); FC1, 176Hf/177Hf = 0.282182 ± 14, 176Lu/177Hf = 0.00101 (n=5); QGNG, 176Hf/177Hf = 0.281607 ± 9, 176Lu/177Hf = 0.00078 (n=4); and 91500, 176Hf/177Hf = 0.282311 ± 6, 176Lu/177Hf = 0.00030. The variance of laser analyses of these zircon standards relative to their solution values provides a fair and reasonable estimate of the overall uncertainty of individual analyses of unknowns.
This presentation will give examples of how this technique has been applied effectively and others where its application may be potentially problematic.